JPH0564450B2 - - Google Patents

Info

Publication number
JPH0564450B2
JPH0564450B2 JP59195728A JP19572884A JPH0564450B2 JP H0564450 B2 JPH0564450 B2 JP H0564450B2 JP 59195728 A JP59195728 A JP 59195728A JP 19572884 A JP19572884 A JP 19572884A JP H0564450 B2 JPH0564450 B2 JP H0564450B2
Authority
JP
Japan
Prior art keywords
reduction projection
exposure area
image
substrate
exposure
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP59195728A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6174338A (ja
Inventor
Tsutomu Tanaka
Yoshitada Oshida
Nobuyuki Akyama
Minoru Yoshida
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP59195728A priority Critical patent/JPS6174338A/ja
Publication of JPS6174338A publication Critical patent/JPS6174338A/ja
Publication of JPH0564450B2 publication Critical patent/JPH0564450B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP59195728A 1984-09-20 1984-09-20 縮小投影露光装置およびその方法 Granted JPS6174338A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP59195728A JPS6174338A (ja) 1984-09-20 1984-09-20 縮小投影露光装置およびその方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP59195728A JPS6174338A (ja) 1984-09-20 1984-09-20 縮小投影露光装置およびその方法

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP6211247A Division JP2728368B2 (ja) 1994-09-05 1994-09-05 露光方法

Publications (2)

Publication Number Publication Date
JPS6174338A JPS6174338A (ja) 1986-04-16
JPH0564450B2 true JPH0564450B2 (en]) 1993-09-14

Family

ID=16345973

Family Applications (1)

Application Number Title Priority Date Filing Date
JP59195728A Granted JPS6174338A (ja) 1984-09-20 1984-09-20 縮小投影露光装置およびその方法

Country Status (1)

Country Link
JP (1) JPS6174338A (en])

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6336526A (ja) * 1986-07-30 1988-02-17 Oki Electric Ind Co Ltd ウエハ露光装置
JP2556015B2 (ja) * 1986-12-25 1996-11-20 株式会社ニコン 位置ずれ検出装置
US6094268A (en) * 1989-04-21 2000-07-25 Hitachi, Ltd. Projection exposure apparatus and projection exposure method

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
IT1037606B (it) * 1974-06-06 1979-11-20 Ibm Apparecchiatura ottica perfezionata utile per la fabbricazione di circuiti integrati
EP0097380A3 (en) * 1979-04-02 1984-08-29 Eaton-Optimetrix Inc. A system for positioning a utilization device
NL186353C (nl) * 1979-06-12 1990-11-01 Philips Nv Inrichting voor het afbeelden van een maskerpatroon op een substraat voorzien van een opto-elektronisch detektiestelsel voor het bepalen van een afwijking tussen het beeldvlak van een projektielenzenstelsel en het substraatvlak.
JPS5696203A (en) * 1979-12-27 1981-08-04 Fujitsu Ltd Detection device for optical position
JPS56101112A (en) * 1980-01-16 1981-08-13 Fujitsu Ltd Exposure method
JPS58156937A (ja) * 1982-03-12 1983-09-19 Hitachi Ltd 露光装置
JPS5947731A (ja) * 1982-09-10 1984-03-17 Hitachi Ltd 投影露光装置におけるオ−トフオ−カス機構
JPS5999215A (ja) * 1982-11-27 1984-06-07 Jeol Ltd 物体の表面高さ測定装置
JPS5999216A (ja) * 1982-11-27 1984-06-07 Jeol Ltd 物体の表面高さ測定装置
JPS59121932A (ja) * 1982-12-28 1984-07-14 Fujitsu Ltd 自動焦点制御装置

Also Published As

Publication number Publication date
JPS6174338A (ja) 1986-04-16

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Legal Events

Date Code Title Description
EXPY Cancellation because of completion of term